15 December 1993 Grating parameter estimation using scatterometry
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Abstract
The trend towards smaller design geometries for microelectronics devices places unprecedented demands on the measurement of these small structures. Two sample problems are considered. In the first case we predict the shape of developed photoresist gratings from diffraction data obtained from an angle scanning scatterometer in which a detector tracks a particular diffraction order as the angle of incidence is varied. The second problem we consider is the prediction of depths of cylindrical cells etched into Silicon. A dome scatterometer is used to collect the 2-D diffraction signal and in this case the experimental data is used to construct a data base of scatter signals.
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S. Sohail H. Naqvi, John Robert McNeil, Richard H. Krukar, Ziad R. Hatab, "Grating parameter estimation using scatterometry", Proc. SPIE 1992, Miniature and Micro-Optics and Micromechanics, (15 December 1993); doi: 10.1117/12.165685; https://doi.org/10.1117/12.165685
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