Monolithically integrated refractive optical interconnection networks

Maria Kufner; Stefan Kufner; Michael Frank

doi:10.1117/12.165683

15 December 1993 Monolithically integrated refractive optical interconnection networks

Maria Kufner, Stefan Kufner, Michael Frank

Proceedings Volume 1992, Miniature and Micro-Optics and Micromechanics; (1993) https://doi.org/10.1117/12.165683
Event: SPIE's 1993 International Symposium on Optics, Imaging, and Instrumentation, 1993, San Diego, CA, United States

Abstract

Deep etch lithography of PMMA by proton lithography is a powerful tool for the fabrication of monolithically integrated fully refractive microlenses, microprisms, and microbeamsplitters. This technique can be applied to many applications in the field of free space optical interconnects.

Citation Download Citation

Maria Kufner, Stefan Kufner, and Michael Frank "Monolithically integrated refractive optical interconnection networks", Proc. SPIE 1992, Miniature and Micro-Optics and Micromechanics, (15 December 1993); https://doi.org/10.1117/12.165683

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