Fabrication, alignment, and test of an all-reflective soft x-ray microlithography objective

Kenneth R. Castle; Mitchell C. Ruda; Timothy M. Gleeson; Daniel A. Tichenor; John E. Bjorkholm; Marc D. Himel; Tanya E. Jewell

doi:10.1117/12.160420

15 October 1993 Fabrication, alignment, and test of an all-reflective soft x-ray microlithography objective

Kenneth R. Castle, Mitchell C. Ruda, Timothy M. Gleeson, Daniel A. Tichenor, John E. Bjorkholm, Marc D. Himel, Tanya E. Jewell

Author Affiliations +

Proceedings Volume 1996, Optical Alignment; (1993) https://doi.org/10.1117/12.160420
Event: SPIE's 1993 International Symposium on Optics, Imaging, and Instrumentation, 1993, San Diego, CA, United States

Abstract

A 20 power (20X) all-reflective microlithography objective has been fabricated for use in the soft x-ray region at a wavelength of 13 nm. The design uses the Schwarzschild configuration where two spherical mirrors form a point image from a point object. The centers of curvature of the two mirrors in such a system are coincident. However, to increase field of view, fifth- order spherical must be balanced by third-order spherical. This is accomplished by separating the two curvature centers longitudinally. Lateral separations quickly introduce coma into the wavefront. Holding the curvature center positions rigidly in place relative to the object and image positions is required for maintaining the wavefront quality. Suitable x-ray sources are not common; therefore, the rigidity must also be viewed as a level of ruggedness suitable for transportation from the assembly facility to the test facility. In this paper we share the techniques that we have used to satisfy the requirements of MTF, wavefront quality, ease of alignment, and ruggedness.

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Kenneth R. Castle, Mitchell C. Ruda, Timothy M. Gleeson, Daniel A. Tichenor, John E. Bjorkholm, Marc D. Himel, and Tanya E. Jewell "Fabrication, alignment, and test of an all-reflective soft x-ray microlithography objective", Proc. SPIE 1996, Optical Alignment, (15 October 1993); https://doi.org/10.1117/12.160420

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