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25 November 1993 Some oxide films deposited by reactive low-voltage plasma-assisted evaporation
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Abstract
Low voltage plasma assisted evaporation (PAE) technique has been investigated as an effective evaporation technique for the deposition of oxide films of high optical performance. The PAE process consists of an electron beam evaporator and a large current plasma source. The guided wave method is used to measure the refractive index and attenuation coefficients of guided modes of some oxide films deposited by PEA. The experimental systems and results are presented.
© (1993) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Xu Liu, Bin Wang, Gan Wang, Peifu Gu, and Jinfa Tang "Some oxide films deposited by reactive low-voltage plasma-assisted evaporation", Proc. SPIE 2000, Current Developments in Optical Design and Optical Engineering III, (25 November 1993); https://doi.org/10.1117/12.163657
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