1 March 1994 Novel technique for performing ellipsometric measurements in a submicrometer area
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Abstract
We have developed a novel technique for performing simple phase-sensitive optical measurements in a sub-micrometer area. We presently use this technique to measure film stacks commonly found in the semiconductor industry. This article explains the theory behind this technique and presents several examples demonstrating the capabilities of the system.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jeffrey T. Fanton, Jon L. Opsal, Allan Rosencwaig, David Willenborg, "Novel technique for performing ellipsometric measurements in a submicrometer area", Proc. SPIE 2004, Interferometry VI: Applications, (1 March 1994); doi: 10.1117/12.172605; https://doi.org/10.1117/12.172605
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