1 February 1994 Production and characterization of ion-beam-sputtered multilayers
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Abstract
We report on the application of low pressure ion beam sputtering combined with simultaneous (neutralized) ion beam polishing to the production of multilayer structures for x-ray optics. Initial examination of these structures by high resolution diffractometry at 0.154 nm indicates that the structures exhibit a high degree of structural perfection.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Joseph Pedulla, Joseph Pedulla, Richard D. Deslattes, Richard D. Deslattes, } "Production and characterization of ion-beam-sputtered multilayers", Proc. SPIE 2011, Multilayer and Grazing Incidence X-Ray/EUV Optics II, (1 February 1994); doi: 10.1117/12.167240; https://doi.org/10.1117/12.167240
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