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1 February 1994 Synthesis and measurement of normal incidence x-ray multilayer mirrors optimized for a photon energy of 390 eV
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Abstract
Problems of short period multilayer mirrors fabrication are discussed. Results of synthesis of multilayer structures with nanometer period are presented. The shortest period observed is 13 angstroms for W - Si and W - B4C sputtered multilayers. Measurements of near normal incidence reflectivity at (lambda) equals 31 - 32 angstroms are described for W - Sc multilayers with period about 16 angstroms. Measured reflectivity achieves 3.3% and is in good agreement with theoretical model.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Anatoli I. Fedorenko, V. V. Kondratenko, Yurii P. Pershin, S. A. Yulin, E. N. Zubarev, Howard A. Padmore, K. C. Cheung, Gert E. van Dorssen, M. Roper, Igor V. Kozhevnikov, L. L. Balakireva, and Alexander V. Vinogradov "Synthesis and measurement of normal incidence x-ray multilayer mirrors optimized for a photon energy of 390 eV", Proc. SPIE 2012, Ultrashort Wavelength Lasers II, (1 February 1994); https://doi.org/10.1117/12.167386
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