1 February 1994 Ealing Schwarzschild microscope using 50-60-nm illumination from a laser plasma EUV source
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Abstract
The construction of an extreme ultraviolet reflection imaging microscope at CREOL using an Ealing Schwarzschild objective and a laser-produced plasma source is summarized. Proposed operation of the present system in the 50 - 60 nm wavelength region is discussed.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Lan Sun, Lan Sun, Gary A. Sweezey, Gary A. Sweezey, William T. Silfvast, William T. Silfvast, } "Ealing Schwarzschild microscope using 50-60-nm illumination from a laser plasma EUV source", Proc. SPIE 2015, Applications of Laser Plasma Radiation, (1 February 1994); doi: 10.1117/12.168013; https://doi.org/10.1117/12.168013
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