Translator Disclaimer
1 February 1994 Mass-limited laser-plasma cryogenic target for 13-nm point x-ray sources for lithography
Author Affiliations +
Abstract
We propose the use of mass-limited, line emitting cryogenic targets for SXPL, which permit a continuous supply of targets without the problem of particulate debris and excessive heating of multilayer optics by an intense x-ray flux in wavelength regions outside the multilayer bandwidth. In preliminary experiments we measured the oxygen line emission in the vicinity of 13 nm. The x-ray emitting plasma was produced by using a laser intensity of 2 X 1012 W/cm2 on the surface of an ice target. From the observed crater on target we can deduce that clusters are also ejected from cryogenic targets.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Feng Jin, Kai Gabel, Martin C. Richardson, Masataka Kado, Andrew F. Vasil'ev, and Daniel Salzmann "Mass-limited laser-plasma cryogenic target for 13-nm point x-ray sources for lithography", Proc. SPIE 2015, Applications of Laser Plasma Radiation, (1 February 1994); https://doi.org/10.1117/12.167993
PROCEEDINGS
9 PAGES


SHARE
Advertisement
Advertisement
RELATED CONTENT


Back to Top