1 February 1994 Optimization of excimer laser-induced x-ray sources for soft x-ray projection lithography
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Abstract
We report results on high power excimer lasers and their application to generating laser plasma soft x-ray sources. A conversion efficiency of laser light to monochromatized soft x- ray radiation of 0.7% has been achieved at 13.5 nm (2% BW). Two methods to mitigate the production of plasma debris have been analyzed: tape targets and the use of Kr as a buffer gas. The optimal coating thickness of tape targets coated with Ta has been determined as 1 micrometers . Ta tape targets and the Kr buffer were used in a debris contamination test of 105 pulses and evaluated by the loss in reflectivity of a normal incidence Mo-Si multilayer mirror.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Fred Bijkerk, Fred Bijkerk, Leonid A. Shmaenok, Leonid A. Shmaenok, Eric Louis, Eric Louis, A. van Honk, A. van Honk, Marnix J. van der Wiel, Marnix J. van der Wiel, Y. Y. Platonova, Y. Y. Platonova, Alexander P. Shevelko, Alexander P. Shevelko, Alexander V. Mitrofanov, Alexander V. Mitrofanov, Frank Voss, Frank Voss, R. Desor, R. Desor, Helmut Frowein, Helmut Frowein, Bernard K. Nikolaus, Bernard K. Nikolaus, } "Optimization of excimer laser-induced x-ray sources for soft x-ray projection lithography", Proc. SPIE 2015, Applications of Laser Plasma Radiation, (1 February 1994); doi: 10.1117/12.167989; https://doi.org/10.1117/12.167989
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