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1 February 1994 Picosecond excimer laser-plasma x-ray source for microscopy, biochemistry, and lithography
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At Rutherford Appleton Laboratory we developed a high repetition rate, picosecond, excimer laser system which generates a high temperature and density plasma source emitting approximately 200 mW (78 mW/sr) x ray average power at h(nu) approximately 1.2 KeV or 0.28 KeV < h(nu) < 0.53 KeV (the `water window'). At 3.37 nm wavelength the spectral brightness of the source is approximately 9 X 1011 photons/s/mm2/mrad2/0.1% bandwidth. The x-ray source serves a large user community for applications such as: scanning and holographic microscopy, the study of the biochemistry of DNA damage and repair, microlithography and spectroscopy.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
I. C. Edmond Turcu, Ian N. Ross, P. Trenda, C. W. Wharton, R. A. Meldrum, Hiroyuki Daido, M. S. Schulz, P. Fluck, Alan G. Michette, A. P. Juna, Juan R. Maldonado, Harry Shields, Gregory J. Tallents, L. Dwivedi, J. Krishnan, D. L. Stevens, T. Jenner, Dimitri Batani, and H. Goodson "Picosecond excimer laser-plasma x-ray source for microscopy, biochemistry, and lithography", Proc. SPIE 2015, Applications of Laser Plasma Radiation, (1 February 1994);


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