1 February 1994 Thermal stability of Mo-based multilayer x-ray mirrors
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Mo-based multilayers show high reflectivities in the 8 - 20 nm region at normal incidence. We have evaluated the soft x-ray reflectivities and the effects of thermal annealing on both reflectivity and the layered structures of these Mo-based multilayers. The Cu-K (alpha) x-ray first-order Bragg-peak reflectivity of the Mo/Si multilayer markedly decreases at annealing temperatures above 400 degree(s)C. TEM observation reveals that the thermally induced deteriorations of Mo/B4C and Mo/SiC multilayers are smaller than those of the Mo/Si multilayer. The Mo/Si multilayer reflectivity at a wavelength of about 13 nm decreases greatly with 600 degree(s)C annealing. However, the Mo/B4C and Mo/SiC multilayers maintain higher reflectivities at the same wavelength. These results suggests that the Mo/B4C and Mo/SiC multilayers are superior to a Mo/Si multilayer in terms of thermal stability.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yoshikazu Ishii, Yoshikazu Ishii, Hisataka Takenaka, Hisataka Takenaka, Tomoaki Kawamura, Tomoaki Kawamura, Tsuneyuki Haga, Tsuneyuki Haga, Hiroo Kinoshita, Hiroo Kinoshita, } "Thermal stability of Mo-based multilayer x-ray mirrors", Proc. SPIE 2015, Applications of Laser Plasma Radiation, (1 February 1994); doi: 10.1117/12.167991; https://doi.org/10.1117/12.167991


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