6 December 1993 Radiation damage effects in far-ultraviolet filters and substrates
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Abstract
New advances in VUV thin film filter technology have been made using filter designs with multilayers of materials such as Al2O3, BaF2, CaF2, HfO2, LaF3, MgF2, and SiO2. Our immediate application for these filters will be in an imaging system to be flown on a satellite where a 2 X 9 RE orbit will expose the instrument to approximately 275 krads of radiation. In view of the fact that no previous studies have been made on potential radiation damage of these materials on the thin film format, we report on such an assessment here.
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Charles E. Keffer, Marsha R. Torr, Muamer Zukic, James F. Spann, Douglas G. Torr, Jongmin Kim, "Radiation damage effects in far-ultraviolet filters and substrates", Proc. SPIE 2018, Passive Materials for Optical Elements II, (6 December 1993); doi: 10.1117/12.165218; https://doi.org/10.1117/12.165218
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