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6 December 1993 Resulting profile of holographically recorded structures in photoresists
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Abstract
A theoretical model is developed to compute the resulting profile of structures holographically recorded in photoresists. The model takes into account the effects of exposure, photosensitization and isotropy of wet development. The effects of isotropy of wet development, non-linearity of the photoresist response curve, background-light, and the stationary waves produced by reflection at the film-substrate interface are analyzed using the model and the results are experimentally confirmed.
© (1993) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Lucila H. D. Cescato, Bernardo M. de Assuncao Mello, Ivan F. da Costa, and Carlos R. A. Lima "Resulting profile of holographically recorded structures in photoresists", Proc. SPIE 2018, Passive Materials for Optical Elements II, (6 December 1993); https://doi.org/10.1117/12.165228
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