Resist recording media for holography at 10.6 um

Rene M. Beaulieu; Roger A. Lessard; See-Leang Chin

doi:10.1117/12.166346

20 January 1994 Resist recording media for holography at 10.6 μm

Rene M. Beaulieu, Roger A. Lessard, See-Leang Chin

Proceedings Volume 2042, Photopolymers and Applications in Holography, Optical Data Storage, Optical Sensors, and Interconnects; (1994) https://doi.org/10.1117/12.166346
Event: Optics Quebec, 1993, Quebec City, Canada

Abstract

Phase holograms have been recorded on resist films with cw and pulsed CO₂ laser light. The relief-phase recordings obtained due to the thermal process involved are analyzed with He-Ne laser light. Holographic characteristics of the recording medium, such as diffraction efficiency vs exposure and spatial frequency, are presented. The capability of resist films to achieve interferometry and for making blazed gratings is demonstrated.

Citation Download Citation

Rene M. Beaulieu, Roger A. Lessard, and See-Leang Chin "Resist recording media for holography at 10.6 μm", Proc. SPIE 2042, Photopolymers and Applications in Holography, Optical Data Storage, Optical Sensors, and Interconnects, (20 January 1994); https://doi.org/10.1117/12.166346

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