12 January 1994 Making blazed holograms with the new REFO-125 photoresist
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Abstract
A new photoresist (REFO-125) is developed especially for holography as well as diffractive optics. It is at least twice as sensitive as conventional photoresists in the spectral range of 350 nm - 520 nm. Using this resist holographic gratings with blazed surface relief profiles have been produced which show diffraction efficiencies of up to 90% for the blaze wavelengths. A theoretical model has been successfully used to determine the holographic recording geometries for various configurations of blazed gratings of transmission or reflection type. Experimental results show that the REFO-125 photoresist allows great modulation depths which are necessary especially for blazed transmission gratings.
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Zishao Yang, Zishao Yang, Irina Menz, Irina Menz, Guenther J. Dausmann, Guenther J. Dausmann, } "Making blazed holograms with the new REFO-125 photoresist", Proc. SPIE 2043, Holographic Imaging and Materials, (12 January 1994); doi: 10.1117/12.165593; https://doi.org/10.1117/12.165593
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