1 February 1994 Direct laser write-on exposure of thick film screens
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The aim of this work was to study the pros and cons of using the laser exposure of thick film screen emulsions (thicknesses 5 - 30 micrometers ) with a mesh count of 200 - 400. A focused Ar+ laser, emitting wavelengths in the UV (351 and 365 nm), was utilized in the exposure of commercial negative diazotype emulsions. A special visible sensitized orthochromatic thick film emulsion was used at a wavelength of 488 nm. The Ar+ laser beam was focused using an objective with a focal length of 28 mm (UV, apochromatic, NA equals 0.32, spot size 1 micrometers ) and 20 mm (visible, NA equals 0.42, spot size 6 micrometers ). The laser beam was raster scanned with an alignment accuracy of 1 micrometers and unit step of 80 nm and was modulated above the thick film screen.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Janne Remes, Janne Remes, Hannu Moilanen, Hannu Moilanen, Seppo Leppaevuori, Seppo Leppaevuori, Juha Vaananen, Juha Vaananen, Antti Uusimaki, Antti Uusimaki, "Direct laser write-on exposure of thick film screens", Proc. SPIE 2045, Laser-Assisted Fabrication of Thin Films and Microstructures, (1 February 1994); doi: 10.1117/12.167541; https://doi.org/10.1117/12.167541

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