Epitaxial growth of LiNbO3 optical-waveguide films by excimer laser ablation

Masamitsu Haruna; Jun Tsutsumi; Yasuo Segawa; Hiroshi Nishihara

doi:10.1117/12.167551

1 February 1994 Epitaxial growth of LiNbO₃ optical-waveguide films by excimer laser ablation

Masamitsu Haruna, Jun Tsutsumi, Yasuo Segawa, Hiroshi Nishihara

Proceedings Volume 2045, Laser-Assisted Fabrication of Thin Films and Microstructures; (1994) https://doi.org/10.1117/12.167551
Event: Optics Quebec, 1993, Quebec City, Canada

Abstract

The epitaxial growth of LiNbO₃ films by the ArF excimer laser ablation is demonstrated to form electro-optic (EO) thin-film waveguides on sapphire and LiTaO₃ c-plates. The x- ray diffraction spectra indicate that the resulting films are well oriented along the c axis when a Li-rich LiNbO₃ ceramics is used as the target. The chemical composition of the film was successfully evaluated by measurement of the extraordinary index n_e on the basis of the guided-wave excitation with prism couplers. Stoichiometric films are grown on both sapphire and LiTaO₃ c-plates by changing the content of excess Li₂O in the target. The propagation loss of 6 dB/cm was attained in the thin-film waveguide on LiTaO₃ c- plate. In addition, the EO effect of the film was roughly estimated by fabrication and characterization of a light deflector with an EO grating.

Citation Download Citation

Masamitsu Haruna, Jun Tsutsumi, Yasuo Segawa, and Hiroshi Nishihara "Epitaxial growth of LiNbO₃ optical-waveguide films by excimer laser ablation", Proc. SPIE 2045, Laser-Assisted Fabrication of Thin Films and Microstructures, (1 February 1994); https://doi.org/10.1117/12.167551

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