1 February 1994 Fabrication of continuous-relief micro-optical elements by direct laser writing in photoresist
Author Affiliations +
Abstract
Progress in the fabrication of continuous-relief micro-optical elements by direct laser writing in photoresist followed by replication into epoxy or polymer materials is described. The technology enables a wide range of micro-optical elements to be fabricated and replicated using Ni shims electroformed from the photoresist originals. Examples of fabricated micro- optical elements are described, including microlens arrays, Fresnel microlenses, kinoforms, and other continuous microrelief phase elements.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Michael T. Gale, Markus Rossi, Helmut Schuetz, "Fabrication of continuous-relief micro-optical elements by direct laser writing in photoresist", Proc. SPIE 2045, Laser-Assisted Fabrication of Thin Films and Microstructures, (1 February 1994); doi: 10.1117/12.167542; https://doi.org/10.1117/12.167542
PROCEEDINGS
9 PAGES


SHARE
Back to Top