1 February 1994 Fundamental process during pulsed-laser deposition of thin films
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Abstract
A model to estimate plasma absorption during deposition of thin films has been developed. In this model, the time-dependent plasma dimension is replaced by the time dependent ablation depth which can be determined by numerical simulations. A model to predict the spatial in- homogeneities in the laser-deposited films has also been developed.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Rajiv K. Singh, Rajiv K. Singh, } "Fundamental process during pulsed-laser deposition of thin films", Proc. SPIE 2045, Laser-Assisted Fabrication of Thin Films and Microstructures, (1 February 1994); doi: 10.1117/12.167549; https://doi.org/10.1117/12.167549
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