1 February 1994 Laser-assisted deposition and etching of silicon for fabrication of refractive and diffractive optical elements
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Abstract
Application of the laser direct writing technique for maskless fabrication of micro-optic components is discussed. Parameters characterizing the laser writing by poly-Si deposition on various substrates and by crystalline Si etching are given. Dimensions of the fabricated features and their topography are described. Results obtained by combining the laser writing with other techniques, such as the blanket deposition of phosphosilicate glass and spin-on glass, and isotropic silicon etching in HF/HNO3 solutions, are presented. Examples of the fabricated microlenses and microgratings are shown.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Hubert Jerominek, Jin Pan, "Laser-assisted deposition and etching of silicon for fabrication of refractive and diffractive optical elements", Proc. SPIE 2045, Laser-Assisted Fabrication of Thin Films and Microstructures, (1 February 1994); doi: 10.1117/12.167559; https://doi.org/10.1117/12.167559
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