1 February 1994 UV routes for approaching low-temperature dielectrics deposition in III-V technology
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Abstract
As a `cold process' photochemical deposition enables us to obtain insulator and dielectric thin films on III-V compounds. To sustain the remarkable progress in the performance of electronic and optical devices may necessitate the utilization of this innocuous processing for novel applications. Possible areas of interest range from simply optically protective coating to layers for highly sophisticated optoelectronic integration of III-V and Si on the same chip.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jean Flicstein, Jean Flicstein, B. Leon, B. Leon, Ian W. Boyd, Ian W. Boyd, } "UV routes for approaching low-temperature dielectrics deposition in III-V technology", Proc. SPIE 2045, Laser-Assisted Fabrication of Thin Films and Microstructures, (1 February 1994); doi: 10.1117/12.167555; https://doi.org/10.1117/12.167555
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