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2 November 1993 Design and fabrication of multiline inhomogeneous rejection filters
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Abstract
The design and fabrication of inhomogeneous single and multi-line rejection filters with good line rejection and pass band transmission has been investigated. The filters were designed with the help of a filter design program developed in-house and optimized analytically for best conformance of the filter spectrum to the design specifications. The experimental filters obtained in this study achieved optical densities in excess of 4.5 in the design rejection range with good transmission and low ripple in the pass band region. The design rejection peak width of 40 nanometers, which was chosen in order to ensure optimum rejection over the required range of incident angles from 0 to 20 degrees, was readily achieved.
© (1993) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Joerg B. Adolph, Robert W. Bertram, Kam L. Yan, Ping Zhou, Renato De Leon, and Denis Vincent "Design and fabrication of multiline inhomogeneous rejection filters", Proc. SPIE 2046, Inhomogeneous and Quasi-Inhomogeneous Optical Coatings, (2 November 1993); https://doi.org/10.1117/12.163544
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