2 November 1993 Properties of multilayer and graded index Si-based coatings deposited in dual-frequency plasma
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Abstract
Optical properties of silicon-based coatings are investigated in which the refractive index n is varied gradually (SiOxNy with continuously changing x and y) or in discrete steps (SiO2/SiN1.3 multilayers). The films are prepared at room temperature in a dual- mode microwave/radiofrequency (MW/RF) plasma in which the substrates are placed on an RF powered substrate holder, while simultaneously exposed to a MW discharge. The films' composition is controlled by the working gas mixture using SiH4, NH3 and N2O, and their microstructure, such as packing density and interface roughness, is controlled independently by varying the energy and the flux of bombarding ions. The deposition process is monitored in-situ by optical emission spectroscopy measurements which are related to the compositional depth profiles provided by elastic recoil detection analysis.
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Daniel Poitras, Daniel Poitras, Jolanta Ewa Klemberg-Sapieha, Jolanta Ewa Klemberg-Sapieha, A. Moussi, A. Moussi, Ludvik Martinu, Ludvik Martinu, } "Properties of multilayer and graded index Si-based coatings deposited in dual-frequency plasma", Proc. SPIE 2046, Inhomogeneous and Quasi-Inhomogeneous Optical Coatings, (2 November 1993); doi: 10.1117/12.163547; https://doi.org/10.1117/12.163547
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