Properties of multilayer and graded index Si-based coatings deposited in dual-frequency plasma

Daniel Poitras; Jolanta Ewa Klemberg-Sapieha; A. Moussi; Ludvik Martinu

doi:10.1117/12.163547

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2 November 1993 Properties of multilayer and graded index Si-based coatings deposited in dual-frequency plasma

Daniel Poitras, Jolanta Ewa Klemberg-Sapieha, A. Moussi, Ludvik Martinu

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Proceedings Volume 2046, Inhomogeneous and Quasi-Inhomogeneous Optical Coatings; (1993) https://doi.org/10.1117/12.163547
Event: Optics Quebec, 1993, Quebec City, Canada

Abstract

Optical properties of silicon-based coatings are investigated in which the refractive index n is varied gradually (SiO_xN_y with continuously changing x and y) or in discrete steps (SiO₂/SiN_1.3 multilayers). The films are prepared at room temperature in a dual- mode microwave/radiofrequency (MW/RF) plasma in which the substrates are placed on an RF powered substrate holder, while simultaneously exposed to a MW discharge. The films' composition is controlled by the working gas mixture using SiH₄, NH₃ and N₂O, and their microstructure, such as packing density and interface roughness, is controlled independently by varying the energy and the flux of bombarding ions. The deposition process is monitored in-situ by optical emission spectroscopy measurements which are related to the compositional depth profiles provided by elastic recoil detection analysis.

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Daniel Poitras, Jolanta Ewa Klemberg-Sapieha, A. Moussi, and Ludvik Martinu "Properties of multilayer and graded index Si-based coatings deposited in dual-frequency plasma", Proc. SPIE 2046, Inhomogeneous and Quasi-Inhomogeneous Optical Coatings, (2 November 1993); https://doi.org/10.1117/12.163547

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