31 December 1993 Fiber optics based in-situ FTIR monitoring of organometallic chemical vapor deposition of compound semiconductors
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Proceedings Volume 2069, Optical Methods for Chemical Process Control; (1993) https://doi.org/10.1117/12.166282
Event: Optical Tools for Manufacturing and Advanced Automation, 1993, Boston, MA, United States
Abstract
Optical fiber-based Fourier transform infrared (FTIR) is investigated as an in-situ monitoring tool for two applications in organometallic chemical vapor deposition (OMCVD): measurement of the concentration of organometallic precursors fed to the system, and detection of gas-phase reactions relevant to the process. The feasibility of the first application is demonstrated using fluoride fibers in case studies with trimethylindium and trimethylgallium. With a short single pass gas-cell, a minimum detection limit of 0.5% is achieved for a one minute scan time. Further reduction in this limit may be realized by improved cell design and longer scan times. The second application of the FTIR technique, in situ monitoring of gas-phase reactions, is also demonstrated. The results are in excellent agreement with previous reported data for the pyrolysis of the two precursors.
© (1993) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Sateria Salim, Sateria Salim, C. K. Lim, C. K. Lim, Klavs F. Jensen, Klavs F. Jensen, Richard D. Driver, Richard D. Driver, } "Fiber optics based in-situ FTIR monitoring of organometallic chemical vapor deposition of compound semiconductors", Proc. SPIE 2069, Optical Methods for Chemical Process Control, (31 December 1993); doi: 10.1117/12.166282; https://doi.org/10.1117/12.166282
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