Remote monitoring of a chemical vapor infiltration process by means of the FTIR system K300

Herbert W. Mosebach; Markus Erhard; M. Resch; Hermann Bittner

doi:10.1117/12.166285

31 December 1993 Remote monitoring of a chemical vapor infiltration process by means of the FTIR system K300

Herbert W. Mosebach, Markus Erhard, M. Resch, Hermann Bittner

Proceedings Volume 2069, Optical Methods for Chemical Process Control; (1993) https://doi.org/10.1117/12.166285
Event: Optical Tools for Manufacturing and Advanced Automation, 1993, Boston, MA, United States

Abstract

The FT-IR system K300, primarily used for environmental monitoring by means of remote sensing techniques, has been modified in such a manner that it could be used for remote monitoring of a SiC chemical vapor infiltration process (CVI). This comprised hardware adaptations to a CVI reaction plant at DASA (MBB), as well as development of analytical methods. First measurements showed the good performance of the K300 system at the reactor. A lot of gaseous species could be detected and qualitatively analyzed (concentration changes).

Citation Download Citation

Herbert W. Mosebach, Markus Erhard, M. Resch, and Hermann Bittner "Remote monitoring of a chemical vapor infiltration process by means of the FTIR system K300", Proc. SPIE 2069, Optical Methods for Chemical Process Control, (31 December 1993); https://doi.org/10.1117/12.166285

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