15 February 1994 CORE 2564 process optimization with the APTCON 4045
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Abstract
This paper describes how the new Hoya Micro Mask APTCON 4045 optical mask processor was used in conjunction with the ETEC CORE 2564 reticle writer in the optimization of a 64 Mb DRAM process. Exposure conditions, develop/etch parameters, and processor variables were individually optimized; results from the ensuing process are analyzed. The major components of the Convac-APT APTCON 4045 processor are described. The system description, physical layout, automation, chemistry handling, and adjustment versatility are all covered. Cassette-to-cassette full automation is used, in support of an extremely tight control over process variability. Fully automatic chemistry handling is implemented, with supply auto- switch, in an isolated safety enclosure. The on-line chemistry and D.I. water are kept under accurately controlled conditions. Great adjustment versatility in the chemistry dispense is provided through unusually maneuverable devices. In addition, other process variables (such as the air velocity and spin speed) can be controlled with unique fineness and range.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Alan Golob, Alan Golob, Greg Mullins, Greg Mullins, Catherine A. Baker, Catherine A. Baker, C. Edward Franks, C. Edward Franks, Asao Shikata, Asao Shikata, } "CORE 2564 process optimization with the APTCON 4045", Proc. SPIE 2087, 13th Annual BACUS Symposium on Photomask Technology and Management, (15 February 1994); doi: 10.1117/12.167286; https://doi.org/10.1117/12.167286
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