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15 February 1994 Chrome-level repair of phase-shift photomasks using conventional focused ion beam repair technology
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Abstract
Applicability of conventional Focused Ion Beam photomask repair techniques is discussed in relation to chrome-level repair of phase-shift masks. Attention is paid to the underlying glass damage caused during chrome removal as well as the residual gallium staining. A technique used to control these issues is presented that does not require depth measurements prior to phase etch of the glass substrate. The applicability of this technique is discussed as it relates to full thickness chrome used in rim and alternating PSMs as well as the thin `leaky' chrome used for attenuated masks.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
William C. Joyce "Chrome-level repair of phase-shift photomasks using conventional focused ion beam repair technology", Proc. SPIE 2087, 13th Annual BACUS Symposium on Photomask Technology and Management, (15 February 1994); https://doi.org/10.1117/12.167272
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