Comparison of state-of-the-art lithography tools

Richard W. Aprile Jr.

doi:10.1117/12.167284

15 February 1994 Comparison of state-of-the-art lithography tools

Richard W. Aprile Jr.

Proceedings Volume 2087, 13th Annual BACUS Symposium on Photomask Technology and Management; (1994) https://doi.org/10.1117/12.167284
Event: 13th Annual BACUS Symposium on Photomask Technology and Management, 1993, Santa Clara, CA, United States

Abstract

The concept of Cpk has been a long accepted method for indicating manufacturing process capability and making critical judgments about expected performance. Within this paper Cpk's are calculated for a set of test masks generated by divergent photomask lithography tools. The MSTM (Manufacturing Simulation Test Mask) uses different address sizes (1.0, 0.5, 0.25, and 0.1 micrometers ) allowing all address structures to be tested on the same mask. A Leica LMS- 2000 was used for the registration measurements. Through critical observation of the data sets' mean and range variance, an insight about contributing error sources is gained and a common ground for unbiased comparison is found.

Citation Download Citation

Richard W. Aprile Jr. "Comparison of state-of-the-art lithography tools", Proc. SPIE 2087, 13th Annual BACUS Symposium on Photomask Technology and Management, (15 February 1994); https://doi.org/10.1117/12.167284

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