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15 February 1994 Die-to-die inspection of phase-shifting masks
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Abstract
The evaluation of three different phase-shifting inspection test masks will be described. Each reticle was used to evaluate the defect detection capabilities on an automated inspection station for a different phase shifting technique. Two test reticles (alternate aperture and sized rim shifter) were fabricated using standard chromium on quartz blanks and one attenuated test reticle was made using thin chromium on a quartz blank provided by Hoya. A comprehensive study was conducted to determine the defect detection rates of phase defects achievable on these reticles using optimized settings for a KLA219HRL-PS automated inspection station. Results show that considerable gains in sensitivity and false detection reduction could be achieved using optimized settings, but phase defect detection and below 0.5 micrometers will require moving to the next generation tool.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Doug J. Stolpe, Christophe Pierrat, Stephen D. Kirkish, and Sheila Vaidya "Die-to-die inspection of phase-shifting masks", Proc. SPIE 2087, 13th Annual BACUS Symposium on Photomask Technology and Management, (15 February 1994); https://doi.org/10.1117/12.167262
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