15 February 1994 Dimensional metrology of phase-shifting masks with scanning probe microscopes
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Abstract
Critical dimension metrology of a phase-shifting mask must include depth as well as width measurements because both the phase and the lateral position of the transmitted photons must be controlled. Scanning probe microscopes are well suited to perform these measurements because they achieve high resolution simultaneously in all three dimensions. As with other microscopes, the probe-sample interaction strongly affects critical dimension measurement. The shape of the probe mixes with the measured object in an intrinsically nonlinear manner. We present measurements of phase-shifting masks performed with a scanning force microscope, and we discuss how they illustrate the capabilities and limitations of the technique.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Joseph E. Griffith, Joseph E. Griffith, Herschel M. Marchman, Herschel M. Marchman, Leslie C. Hopkins, Leslie C. Hopkins, Christophe Pierrat, Christophe Pierrat, Sheila Vaidya, Sheila Vaidya, } "Dimensional metrology of phase-shifting masks with scanning probe microscopes", Proc. SPIE 2087, 13th Annual BACUS Symposium on Photomask Technology and Management, (15 February 1994); doi: 10.1117/12.167254; https://doi.org/10.1117/12.167254
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