15 February 1994 Phase-shifting mask fabrication
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Abstract
The choice of a fabrication technique for phase-shifting masks is described by comparing approaches in which the shifter patterns are defined by etching the substrate (subtractive approach) or by adding a layer to the substrate (additive approach). By reviewing the various fabrication alternatives, a subtractive methodology that allows the fabrication of any type of phase-shift pattern (alternating aperture, assist-slot, rime, chromeless) on the same mask with only three lithographic steps was adopted. This process was extended to the fabrication of attenuated phase-shifting masks. The current processing capabilities are reviewed.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Christophe Pierrat, Christophe Pierrat, John DeMarco, John DeMarco, } "Phase-shifting mask fabrication", Proc. SPIE 2087, 13th Annual BACUS Symposium on Photomask Technology and Management, (15 February 1994); doi: 10.1117/12.167278; https://doi.org/10.1117/12.167278
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