15 February 1994 Through quartz metrology in an automated chemical process
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Abstract
This paper introduces the theory of operation for `through-quartz' metrology as it applies to endpoint detection in an automated chemical processor, the Siscan IMPACT 7000. Further, a statistical analysis of actual manufacturing results will be presented with a focus on improvements in manufacturing process capability over standard manufacturing techniques as well as improved reticle performance in the wafer lithographers' environment through tighter image fidelity to design rules.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Alex R. Naderi, Alex R. Naderi, } "Through quartz metrology in an automated chemical process", Proc. SPIE 2087, 13th Annual BACUS Symposium on Photomask Technology and Management, (15 February 1994); doi: 10.1117/12.167253; https://doi.org/10.1117/12.167253
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