1 February 1993 Novel algorithm for comparative measurement of submicrometre features on photomasks
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Proceedings Volume 2088, Laser Dimensional Metrology: Recent Advances for Industrial Application; (1993) https://doi.org/10.1117/12.168065
Event: Laser Dimensional Metrology: Recent Advances for Industrial Application, 1993, Brighton, United Kingdom
Abstract
A new method for the measurement of linewidths on integrated circuit photomasks using an optical microscope is described allowing the accurate measurement of features which are not fully resolved, even when the instrument is not perfectly focused and there is considerable spherical aberration in the optical imaging system. This paper demonstrates how an optical microscope which produces scaled image intensity profiles can be calibrated to exploit a new measurement algorithm.
© (1993) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
John W. Nunn, P. Salmon, "Novel algorithm for comparative measurement of submicrometre features on photomasks", Proc. SPIE 2088, Laser Dimensional Metrology: Recent Advances for Industrial Application, (1 February 1993); doi: 10.1117/12.168065; https://doi.org/10.1117/12.168065
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