15 February 1994 Influence of adjustment accuracy on the image quality for laser cluster systems of microlithography
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Abstract
Aberration research in the optic system was conducted by finding possible angles between the axis of the illuminator and a lens on the basis of the analysis of intensity on the image plane. Intensity distribution was drawn after calculation of aberration deformations of the wave front. Quality of the image of three lines with crosscut size of 0.5, 1.0 and 3.0 micrometers on the margin of 5 X 5 mm field was investigated with the worse variant taken into account.
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Victor V. Boksha, Anatoly I. Sharendo, Vyjacheslav E. Obukhov, Eduard I. Tochitsky, "Influence of adjustment accuracy on the image quality for laser cluster systems of microlithography", Proc. SPIE 2091, Microelectronic Processes, Sensors, and Controls, (15 February 1994); doi: 10.1117/12.167332; https://doi.org/10.1117/12.167332
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