15 February 1994 Manufacturing integration of real-time laser interferometry to isotropically etch silicon oxide films for contacts and vias
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Abstract
Two methods, real-time in-situ and pre/post measurement, for control as well as issues associated with the laser interferometry method will be compared and discussed in this paper.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jake Pope, Robert Woodburn, J. Watkins, Roger B. Lachenbruch, and Gregory Viloria "Manufacturing integration of real-time laser interferometry to isotropically etch silicon oxide films for contacts and vias", Proc. SPIE 2091, Microelectronic Processes, Sensors, and Controls, (15 February 1994); doi: 10.1117/12.167339; https://doi.org/10.1117/12.167339
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