15 February 1994 On-line optimization of stop-etch time
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Abstract
Two separate modeling approaches are shown to be able to estimate the spatially local end point time distribution of a plasma etch, from nonochromatic emission data, before the etch is complete. The distribution can be used to determine optimum stop-etch time.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Songling Cao, R. Russell Rhinehart, "On-line optimization of stop-etch time", Proc. SPIE 2091, Microelectronic Processes, Sensors, and Controls, (15 February 1994); doi: 10.1117/12.167361; https://doi.org/10.1117/12.167361
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