15 February 1994 Run-to-run control framework for VLSI manufacturing
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Abstract
A run-to-run (R2R) control framework has been developed for application to supervisory control of semiconductor manufacturing processes. This generic framework, which is being developed for eventual transfer to industry, is one component of a multi-level control system that includes real-time equipment and process control as well as pseudo-real-time process control elements operating in conjunction with the R2R controller. The framework is compliant with existing trends and standards in industry. At the heart of the framework is a generic cell controller implementation that serves to support the R2R control algorithm and coordinate control and information flow between the various R2R control modules. This implementation provides for the easy incorporation of commercially available software into the control scheme.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
James R. Moyne, Hossein Etemad, Michael E. Elta, "Run-to-run control framework for VLSI manufacturing", Proc. SPIE 2091, Microelectronic Processes, Sensors, and Controls, (15 February 1994); doi: 10.1117/12.167358; https://doi.org/10.1117/12.167358
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