30 August 1993 Optical characterization of thin films using surface polaritons and surface electromagnetic waves measurements
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Proceedings Volume 2104, 18th International Conference on Infrared and Millimeter Waves; 210449 (1993) https://doi.org/10.1117/12.2298585
Event: 18th International Conference on Infrared and Millimeter Waves, 1993, Colchester, United Kingdom
Abstract
Reflectivity and transmittance measurements are extensively usingfor thin film studies. However for extremely thin films their sensitivityis not enough to obtain good spectra and to derive film dielectricfunction. The new facilities are promised by the application of surfacepolaritons (SP) and surface electromagnetic waves (SEW) for opticalstudies of dielectric, semiconductor and metal surfaces and forspectroscopy of thin films on them [1]. The surface polaritons andplasmons being localized exactly on the surface (with the maximum ofelectric field on it) are extremely sensitive to the presence of thinfilms being the monolayers or submonolayers.
© (1993) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
E. V. Alieva, "Optical characterization of thin films using surface polaritons and surface electromagnetic waves measurements", Proc. SPIE 2104, 18th International Conference on Infrared and Millimeter Waves, 210449 (30 August 1993); doi: 10.1117/12.2298585; https://doi.org/10.1117/12.2298585
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