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28 July 1994 Comparison of the optical properties of oxide films deposited by reactive-dc-magnetron sputtering with those of ion-beam-sputtered and electron-beam-evaporated films
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Abstract
Films produced by reactive-dc-magnetron sputtering are generally dense and homogeneous. Thus their optical properties are similar to those of ion-beam-sputtered films and distinct from the properties of the more porous electron-beam evaporated films. In this paper, the measured results of the dispersive refractive index n and extinction coefficient k are presented for single- layer films of SiO2, Al2O3, HfO2, Ta2O5, Nb2O5, and TiO2 produced by the three processes. For some of the magnetron-sputtered films, it was necessary to modulate the dc power supply in order to suppress the electrical arcing at the target.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Bradley J. Pond, Tu Du, J. Sobczak, and Charles K. Carniglia "Comparison of the optical properties of oxide films deposited by reactive-dc-magnetron sputtering with those of ion-beam-sputtered and electron-beam-evaporated films", Proc. SPIE 2114, Laser-Induced Damage in Optical Materials: 1993, (28 July 1994); https://doi.org/10.1117/12.180926
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