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28 July 1994 Damage thresholds and optical stabilities of fluoride HR coatings for 193 nm
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We investigated the damage thresholds and optical stabilities of 193 nm fluoride HR coatings consisting of NdF3/Na3AlF6 and LaF3/Na3AlF3. These coatings were deposited on fused silica substrates by conventional electron beam (EB) and ion assisted deposition process (IAD). Damage thresholds of LaF3/Na3AlF6 HRs were significantly increased by laser conditioning procedure and low index overcoating when they were deposited by EB and low energy IAD process. NdF3/Na3AlF6 HRs showed negligible laser conditioning effect except certain few case, and had considerably lower damage thresholds than LaF3/Na3AlF6 HRs with conditioning (1.8 J/cm2). Optical stabilities of these HRs were significantly improved by low energy IAD process (50 - 100 eV) which had not harmful influence on damage thresholds.
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Takao Izawa, N. Yamamura, R. Uchimura, and T. Yakuoh "Damage thresholds and optical stabilities of fluoride HR coatings for 193 nm", Proc. SPIE 2114, Laser-Induced Damage in Optical Materials: 1993, (28 July 1994); doi: 10.1117/12.180929;

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