28 July 1994 UV laser patterning of polymers: in-situ and nondestructive evaluation of incubation phenomena by photothermal techniques
Author Affiliations +
Abstract
The optical absorption coefficient of some polymer materials can be increased by exposure to low fluence UV laser radiation. This phenomenon, known as UV light incubation, has been demonstrated to be a powerful tool for surface patterning of organic polymers. In this paper we report our recent progress in understanding the incubation phenomenon and its application to laser patterning by using various photothermal techniques. The data reported include the in- situ monitored incubation/ablation dynamics and the absolute change in optical absorption and thermal diffusivity of the incubated area. Besides these nondestructive evaluation experiments, some of the incubated sites are exposed to high fluence laser radiation. The results show that fine structures with submicron spatial resolution can be achieved without the necessity to focus tightly the ablation laser beam.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Zhouling Wu, Zhouling Wu, Eckart Matthias, Eckart Matthias, S. S. Xue, S. S. Xue, Y. Zhang, Y. Zhang, "UV laser patterning of polymers: in-situ and nondestructive evaluation of incubation phenomena by photothermal techniques", Proc. SPIE 2114, Laser-Induced Damage in Optical Materials: 1993, (28 July 1994); doi: 10.1117/12.180917; https://doi.org/10.1117/12.180917
PROCEEDINGS
1 PAGES


SHARE
Back to Top