1 June 1994 Excimer laser technology for soft x-ray generation
Author Affiliations +
Proceedings Volume 2115, Visible and UV Lasers; (1994) https://doi.org/10.1117/12.172728
Event: OE/LASE '94, 1994, Los Angeles, CA, United States
An angularly multiplexed XeCl excimer laser system, generating pulses of 4 - 5 ns duration, has been used to investigate soft x ray generation from laser-produced plasmas. For applications in x-ray lithography, the spectral regions of 10 - 15 angstrom and around 135 angstrom have been studied. A laser to x ray conversion efficiency of 5.5% and an x ray power of > 1 W into 2 (pi) steradians have been demonstrated in the shorter wavelength band. At the longer wavelength, the effects of laser intensity and plasma recombination on conversion efficiency have been studied.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Michael F. Powers, Michael F. Powers, Harry Shields, Harry Shields, "Excimer laser technology for soft x-ray generation", Proc. SPIE 2115, Visible and UV Lasers, (1 June 1994); doi: 10.1117/12.172728; https://doi.org/10.1117/12.172728


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