17 June 1994 Optical detection of CH3 during diamond chemical vapor deposition
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Measurements of CH3 have been made using resonance-enhanced multiphoton ionization (REMPI) in two different diamond growth environments. Spatial profiles of methyl above the substrate have been measured in a filament- assisted reactor, which show that the CH3 concentration is depleted near the substrate. The CH3 concentration at the substrate shows an approximate Arrhenius dependence on substrate temperature below 1000 K, characterized by an activation energy of 4 kcal/mole. Methyl measurements were also made in 35 Torr hydrogen/oxygen flame into which methane is injected near the substrate. Radial profiles of methyl, acquired using REMPI, and of CH4, acquired using sampling mass spectroscopy, are in good qualitative agreement with the results of numerical simulations.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
David G. Goodwin, David G. Goodwin, Nick G. Glumac, Nick G. Glumac, Evaldo J. Corat, Evaldo J. Corat, } "Optical detection of CH3 during diamond chemical vapor deposition", Proc. SPIE 2124, Laser Techniques for State-Selected and State-to-State Chemistry II, (17 June 1994); doi: 10.1117/12.178103; https://doi.org/10.1117/12.178103


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