21 July 1994 Laser-focused atomic deposition
Author Affiliations +
Proceedings Volume 2125, Laser Techniques for Surface Science; (1994) https://doi.org/10.1117/12.180858
Event: OE/LASE '94, 1994, Los Angeles, CA, United States
We have demonstrated the use of a standing-wave laser beam to focus chromium atoms as they deposit onto a silicon surface. A permanent array of Cr lines has been fabricated, with line width 65 nm, spacing 213 nm, and height 34 nm. The array covers an area of 0.4 mm X 1 mm, and was deposited in approximately 10 minutes. The lines made in this way constitute a proof-of- principle of an entirely new approach to nanostructure fabrication, with potential for extremely small feature size coupled with massive parallelism.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jabez J. McClelland, R. E. Scholten, Rajeev Gupta, Robert J. Celotta, "Laser-focused atomic deposition", Proc. SPIE 2125, Laser Techniques for Surface Science, (21 July 1994); doi: 10.1117/12.180858; https://doi.org/10.1117/12.180858

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