Pyrolysis of novel and safe phosphorous sources for chemical beam epitaxy applications

C. W. Hill; Laurence P. Sadwick; C. W. Kim; H. H. Ryu; Gerald B. Stringfellow

doi:10.1117/12.175792

11 May 1994 Pyrolysis of novel and safe phosphorous sources for chemical-beam epitaxy applications

C. W. Hill, Laurence P. Sadwick, C. W. Kim, H. H. Ryu, Gerald B. Stringfellow

Proceedings Volume 2140, Epitaxial Growth Processes; (1994) https://doi.org/10.1117/12.175792
Event: OE/LASE '94, 1994, Los Angeles, CA, United States

Abstract

It is well known that PH₃ is highly toxic and safer alternatives need to be found. TBP has a favorable vapor pressure at room temperature and decomposes at a lower temperature than PH₃. Results of a systematic investigation of the pyrolysis of novel phosphorous (P) precursors for chemical beam epitaxy (CBE) that are safer than phosphine are presented. In particular, three topics pertinent to CBE are presented: (1) technical details on the pyrolysis conditions and growth using several novel condensed-phase P-precursors, including tertiarybutylphosphine (TBP); (2) a custom-designed gas-source group V cracker cell; and (3) methods to reduce the cracking temperature of P-containing sources.

Citation Download Citation

C. W. Hill, Laurence P. Sadwick, C. W. Kim, H. H. Ryu, and Gerald B. Stringfellow "Pyrolysis of novel and safe phosphorous sources for chemical-beam epitaxy applications", Proc. SPIE 2140, Epitaxial Growth Processes, (11 May 1994); https://doi.org/10.1117/12.175792

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