12 October 1994 Variable-shaped electron beam lithography application for creation of diffractive optical elements
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Proceedings Volume 2169, Nonconventional Optical Imaging Elements; (1994) https://doi.org/10.1117/12.190216
Event: International Colloquium on Nonconventional Optical Imaging Elements, 1993, Rydzyna-Rokosowo, Poland
Abstract
Peculiarities of variable shaped EBL application to DOE topology generation are regarded. The estimation of exposure data volume is proposed as a function of DOE parameters and approximation accuracy. A special software was developed to prepare DOE's exposure data. Experimental results on topology fabrication are presented for DOE focusing irradiation into a ring with ordered parameters, as well as artificial index gratings.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Sergey V. Babin, Sergey V. Babin, Victor A. Danilov, Victor A. Danilov, } "Variable-shaped electron beam lithography application for creation of diffractive optical elements", Proc. SPIE 2169, Nonconventional Optical Imaging Elements, (12 October 1994); doi: 10.1117/12.190216; https://doi.org/10.1117/12.190216
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