13 May 1994 Direct inclusion of the proximity effect in the calculation of kinoforms
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Abstract
Knowledge of the effects of fabrication using microlithography is essential when trying to reach a desired structure, i.e., when using proximity effect compensation. In this presentation, the particular case of diffractive microlenses, kinoforms, is studied. Normally, compensation for the proximity effect is done after the kinoform structure has been calculated with optical design methods. However, in this presentation it is shown that including the proximity effect already in the optical design methods leads to kinoforms whose optical quality is greatly improved.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jorgen Bengtsson, "Direct inclusion of the proximity effect in the calculation of kinoforms", Proc. SPIE 2194, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing IV, (13 May 1994); doi: 10.1117/12.175819; https://doi.org/10.1117/12.175819
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