13 May 1994 Neon dense plasma focus point x-ray source for ≤ 0.25 um lithography
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A discharge driven, dense plasma focus (DPF) in Neon has been developed at SRL as a point x-ray source for sub-micron lithography. This source is presently capable of delivering approximately 25 J/pulse of Neon K-shell x rays (8 - 14 angstrom) into 4 (pi) steradians with an approximately equals 1.4% wall plug efficiency at a 20 Hz repetition rate. This corresponds to 500 W of average x-ray power. The discharge is produced by a capacitor bank circuit (8 kV, 1.8 kJ) that drives approximately equals 320 kA currents into the DPF load, with approximately equals 1 microsecond(s) rise-times. X rays are produced when a dense pinch of Neon is formed along the axis of the DPF electrodes. Four X ten5 discharges using a cooled DPF head have been fired producing x rays. The variation in the measured x-ray output, over several 104 shots, corresponds to a variation in the dose delivered to a resist 40 cm from the source, of less than 1%. Data showing the measurement of the x-ray output, size, dose delivered to a resist, spectra of the source output, novel beam line concepts, and potential lithographic applications are discussed.
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Rahul R. Prasad, Mahadevan Krishnan, Joseph Mangano, Philip A. Greene, Niansheng Qi, "Neon dense plasma focus point x-ray source for ≤ 0.25 um lithography", Proc. SPIE 2194, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing IV, (13 May 1994); doi: 10.1117/12.175797; https://doi.org/10.1117/12.175797


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